BASF to build a new Automotive Application Center for Asia Pacific

Automotive CentreBASF is investing €33.7 million to builds its first regional Automotive Application Center in Asia Pacific, to be located at the BASF Innovation Campus Asia Pacific (Shanghai), China. The Automotive Application Center will be an integrated part of BASF’s existing research and development (R&D) facilities for coatings solutions within the Innovation Campus. The automotive application center will be equipped with a state-of-the-art spray booth for electrostatic applications, a physical testing lab, and the 3-D robot as well as process catalyst research and development laboratories. Occupying a combined floor space of 5,000 square meters, the facilities are designed to enable customer oriented R&D activities and perform an accurate simulation of OEM paint shops.The start of operations is planned for the end of 2018.

 “This investment is a significant milestone in our effort to strengthen our R&D footprint in Asia Pacific and improve our proximity to customers in the fastest growing region for our automotive coatings solutions,” said Dirk Bremm, President, Coatings division, BASF. “With this new automotive application center, we aim not only to continue our successful investment in automotive OEM coatings in China, but also to address long-term competitiveness in this important automotive market.”

Harald Lauke, President, Advanced Materials & Systems Research and Regional Research Representative for Asia Pacific, BASF, said, “Our R&D capabilities in Asia Pacific will be further strengthened by integrating the new facilities and teams at the Innovation Campus in Shanghai. Technology leadership is a key enabler to support growth in China and to increase our competitiveness in the long run.”

The investment also includes the new Process Catalyst R&D Center that will further strengthen the collaboration with partners in the region, and provide support to BASF’s process catalyst manufacturing site, under construction in Caojing, Shanghai.